Contour X-100: Optical profilometry of photonic structures and sensing materials
Responsible person: Dr Eng. Piotr Kałużyński
Our research includes:
Non-contact and non-invasive monitoring and measurement of surface morphology of materials and structures with roughness below 0.01 μm, particularly sensor structures;
3D measurements of photonic, microelectronic, MEMS, MOEMS, PIC, and other structures, as well as IC microstructure packaging;
Optical measurement of the thickness of metallic and dielectric layers;
Analysis of grain size and micro-particles embedded in the material matrix;
Measurements of structures and materials supported by AFM, SEM-EDS, CLSM, spectroscopic ellipsometry, and microelectronic parameter measurements.
